- Spike anneal for 200 & 300mm wafers
- Advanced single-wafer, single chamber RTP system for 300mm and 200mm applications
- Dual side wafer heating for excellent process results on the wafer
- Superior temperature uniformity through:
- Chamber design using linear lamp arrays
- Wafer rotation
- Wafer edge guard ring on same level as the wafer
- Precise control of thermal budget of rapid thermal process by sophisticated temperature control
- Atmospheric pressure process chamber
- True bridge tool capability from 200mm to 300mm
- Excellent cost of ownership
- Long life-time lamps
- Efficient foot print
3000 Plus Process Chamber – Dual side wafer heating
- Aluminum chamber sealed with top & bottom quartz windows
- 2 x 26 linear lamps _ top and bottom lamp
- Side heating by 2 x 2 linear lamps
- Enhanced temperature uniformity by wafer rotation
- Compensation of edge effects and elimination of slip lines by edge guard ring
Spike Anneal
- True spike anneal temperature profiles with ramp-up rates up to 250°C/s
- Minimized peak widths
- Improved emissivity independence
- Very good wafer-to-wafer repeatability with different film stacks
If you want to see 200mm 3000 Photo, click the link.