mattson 3000 RTP system

  • Advanced single-wafer, single chamber RTP system for 300mm and 200mm applications
  • Dual side wafer heating for excellent process results on the wafer
  • Superior temperature uniformity through:
    • —Chamber design using linear lamp arrays
    • —Wafer rotation
    • —Wafer edge guard ring on same level as the wafer
  • Precise control of thermal budget of rapid thermal process by sophisticated temperature control
  • Atmospheric pressure process chamber
  • True bridge tool capability from 200mm to 300mm
  • Excellent Cost of Ownership
  • Long life-time lamps